Fluorocap-XF Filter Capsule | Highest-flowing all-fluoropolymer PTFE membrane capsule for aggressive applications | Product Series

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Fluorocap-XF Filter Capsule | Highest-flowing all-fluoropolymer PTFE membrane capsule for aggressive applications

Fluorocap-XF Filter Capsule | Highest-flowing all-fluoropolymer PTFE membrane capsule for aggressive applications

The Fluorocap®-XF encapsulated filter cartridge uses a superior asymmetric PTFE membrane which provides unmatched flow rates and on-stream life, and excellent chemical resistance for the most aggressive applications up to 180°C.

Especificações técnicas

  • Marca: Parker
  • Setor: Microelectronics
  • Função: Clarification, Prefiltration, Polishing
  • Mídia: PTFE
  • Construção do filtro: Pleated Membrane
  • Área de filtro: 6.8 ft2, 11.4 ft2
  • Materiais de construção: PFA
  • Material e estrutura do reforço da mangueira: PFA
  • Taxa de fluxo: 4.7 gal/min (gpm/psid) per 10 inch at 0.1 Micron, 7.8 gal/min (gpm/psid) per 10 inch at 0.1 Micron

Descrição completa do produto

The Fluorocap®-XF encapsulated filter cartridge uses a superior asymmetric PTFE membrane which provides unmatched flow rates and on-stream life. Customers using the capsule for viscous fluids like phosphoric acid, have reported flow rates and lifetimes more than twice that of the leading competitor. The advantages of increased bath turnover and longer lifetime improve yields while decreasing filtration costs. In addition, the all-fluoropolymer construction provides excellent chemical resistance for the most aggressive applications up to 180°C. Its integral filter design maximizes up-time with safe and simple change-outs. Available wet-packed for quick installation or Ultraclean wet-packed which offers the lowest metals extractables in the industry.
Features/Benefits
• Large filtration area for longer life
• High flow rates for maximum bath turn over
• Wet-pack option for quick installation
• Ultraclean option for absolute cleanliness
• All-fluoropolymer for maximum chemical resistance
• 100% integrity tested for consistent quality

Applications
• Wet etch and clean filtration for:
–  Hot phosphoric acid
–  Sulfuric acid
–  Hydrofluoric acid
–  Nitric acid
–  Piranha
–  SC1, SC2
–  NMP-based solvents
• Other high temperature or ozonated processes filtration

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