Fluorocap-Select Pleated Membrane Filter Capsule | All-fluoropolymer capsule for aggressive applications | Product Series

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Fluorocap-Select Pleated Membrane Filter Capsule | All-fluoropolymer capsule for aggressive applications

Fluorocap-Select Pleated Membrane Filter Capsule | All-fluoropolymer capsule for aggressive applications

The Fluorocap®-SELECT encapsulated filter cartridge provides exceptional flow rates and on-stream life. It utilizes our unique SELECT pleating that increases filtration area and flow by over 25% compared to our standard Fluorocap filter cartridge.

Technical Specifications

  • Brand: Parker
  • Industry: Microelectronics
  • Function: Clarification, Prefiltration, Polishing
  • Media: PTFE
  • Filter Construction: Pleated Membrane
  • Filter Area: 6, 12.2 ft2
  • Materials of Construction: PFA
  • Hose Reinforcement Material & Structure: PFA
  • Flow Rate: 4.6 GPM/PSID for 10 inch at 0.2 micron, 2.0 GPM/PSID for 10 inch at 0.05 micron, 4.1 GPM/PSID for 10 inch at 0.1 micron, 1.0 GPM/PSID for 4 inch at 0.05 micron, 0.04 GPM/PSID for 4 inch at 0.03 micron, 2.3 GPM/PSID for 4 inch at 0.2 micron, 14.8 GPM/PSID

Full Product Description

The Fluorocap®-SELECT encapsulated filter cartridge provides exceptional flow rates and on-stream life. It utilizes our unique SELECT pleating that increases filtration area and flow by over 25% compared to our standard Fluorocap. This results in increased bath turnover and longer filter lifetime demanded by today’s fabs. The all-fluoropolymer construction provides excellent chemical resistance for the most aggressive applications up to 180°C. Its integral filter design maximizes up-time with safe and simple changeouts. Available wet-packed for quick installation or Ultraclean wet-packed which offers the lowest metals extractables in the industry.
Features/Benefits
• Large filtration area for longer life
• High flow rates for maximum bath turn over
• Wet-pack option for quick installation
• Ultraclean option for absolute cleanliness
• All-fluoropolymer for maximum chemical resistance
• 100% integrity tested for consistent quality

Applications
• Wet etch and clean filtration of:
–  Hot phosphoric acid
–  Sulfuric acid
–  Hydrofluoric acid
–  Nitric acid
–  Piranha
–  SC1, SC2
–  NMP-based solvents
• Filtration for other high temperature or ozonated processes

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