Fluorocap Filter Capsule | All-fluoropolymer capsule for aggressive wet etch and clean applications | ParkerGB

Fluorocap Filter Capsule | All-fluoropolymer capsule for aggressive wet etch and clean applications | Product Series

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Fluorocap Filter Capsule | All-fluoropolymer capsule for aggressive wet etch and clean applications

Fluorocap Filter Capsule | All-fluoropolymer capsule for aggressive wet etch and clean applications

The Fluorocap® encapsulated filter cartridge is our standard product for aggressive wet etch and clean applications. The Fluorocap® encapsulated filter cartridge provides good flow rates and on-stream life at an economical price.

Technical Specifications

  • Brand: Parker
  • Industry: Microelectronics
  • Function: Clarification, Prefiltration, Polishing
  • Media: PTFE
  • Filter Construction: Pleated Membrane
  • Flow Rate: 2 gal/min (gpm/psid) per 4 inch at 0.2 Micron, 1.5 gal/min (gpm/psid) per 4 inch at 0.1 Micron, 4.4 gal/min (gpm/psid) per 4 inch at 0.2 Micron, 0.7 gal/min (gpm/psid) per 4 inch at 0.05 Micron, 3.2 gal/min (gpm/psid) per 4 inch at 0.45 Micron, 4.1 gal/min (gpm/psid) per 10 inch at 0.2 Micron, 1.5 gal/min (gpm/psid) per 1
  • Filter Area: 4.8 ft2, 9.8 ft2
  • Materials of Construction: PFA
  • Hose Reinforcement Material & Structure: PFA
Safety Warning

Full Product Description

The Fluorocap® encapsulated filter cartridge is our standard product for aggressive wet etch and clean applications. It provides good flow rates and on-stream life at an economical price. The all-fluoropolymer construction provides excellent chemical resistance for the most aggressive applications up to 180°C. Its integral filter design maximizes up-time with safe and simple change-outs. Available wet-packed for quick installation or Ultraclean wet-packed which offers the lowest metals extractables in the industry.
Features/Benefits
• Economical
• Wide range of configurations and ratings
• Wet-pack option for quick installation
• Ultraclean option for absolute cleanliness
• All-fluoropolymer for maximum chemical resistance
• 100% integrity tested for consistent quality

Applications
• Wet etch and clean filtration for:
–  Hot phosphoric acid
–  Sulfuric acid
–  Hydrofluoric acid
–  Nitric acid
–  Piranha
–  SC1, SC2
–  NMP-based solvents
• Filtration for other high temperature or ozonated processes

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