Fluoroflow-XF Membrane Filter Cartridge | All-fluoropolymer with high flow asymmetric PTFE membrane | Parker NA

Fluoroflow-XF Membrane Filter Cartridge | All-fluoropolymer with high flow asymmetric PTFE membrane | Product Series

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Fluoroflow-XF Membrane Filter Cartridge | All-fluoropolymer with high flow asymmetric PTFE membrane

Fluoroflow-XF Membrane Filter Cartridge | All-fluoropolymer with high flow asymmetric PTFE membrane

Parker’s Fluoroflow-XF all-fluoropolymer membrane filter cartridge provides unmatched flow rates and on-stream life with excellent chemical resistance for aggressive applications up to 150°C.

Technische Daten

  • Marke: Parker
  • Industrie: Microelectronics
  • Funktion: Clarification, Prefiltration, Polishing
  • Medien: PTFE
  • Filterauslegung: Pleated Membrane
  • Endkappenwerkstoff: Fluoropolymer
  • Kerntyp: Fluoropolymer
  • Material & Struktur Schlauchverstärkung: Fluoropolymer
  • Durchfluss: 3.3 gal/min (gpm/psid) per 10 inch Cartridge Equivalent, 9.5 gal/min (gpm/psid) per 10 inch Cartridge Equivalent, 5.7 gal/min (gpm/psid) per 10 inch Cartridge Equivalent
Safety Warning

Vollständige Produktbeschreibung

The Fluoroflow®-XF filter cartridge uses a superior high-flux asymmetric PTFE membrane which provides unmatched flow rates and on-stream life. Customers using the filter cartridge for viscous fluids like phosphoric acid, have reported flow rates and lifetimes more than twice that of the leading competitor. The benefits of increased bath turnover and longer life are improved process performance and lower filtration costs. In addition, the all-fluoropolymer construction provides excellent chemical resistance for the most aggressive applications up to 150°C. Available dry, or wet-packed for quick installation. Our Ultraclean wetpacked option offers the lowest metals extractables in the industry.
Features/Benefits
• Highest flow rates in the industry
• Longest lifetime
• Wet-pack option for quick installation
• Ultraclean option for absolute cleanliness
• All-fluoropolymer for maximum chemical resistance
• 100% integrity tested for consistent quality
Applications
• Wet etch and clean filtration for
– Hot phosphoric acid
– Sulfuric acid
– Hydrofluoric acid
– Nitric acid
– Piranha
– SC1,SC2
– NMP-based solvents
• Other high temperature or ozonated processes filtration
• Filtration for Ultrapure electronics-grade chemical manufacturing

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