Fluoroflow-Select Pleated Membrane Filter Cartridge | Parker NA

Fluoroflow-Select Pleated Membrane Filter Cartridge | Série de produits

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Fluoroflow-Select Pleated Membrane Filter Cartridge

Fluoroflow-Select Pleated Membrane Filter Cartridge

The Fluoroflow-Select pleated membrane filter cartridge provides exceptional flow rates and on-stream life. It utilizes our unique SELECT pleat technology which increases filtration area and flow rate by over 70% versus our standard Fluoroflow filter.

Caractéristiques techniques

  • Type de noyau : Fluoropolymer
  • Marque : Parker
  • Matériau de l'embout : Fluoropolymer
  • Structure et matériau de renfort du flexible : Fluoropolymer
  • Secteur : Microelectronics
  • Fonction : Clarification, Polishing, Prefiltration
  • FluideMédia : PTFE
  • Construction du filtre : Pleated Membrane
  • Débit : 4.1GPM/PSID per 10 inch cartridge equivalent, 4.6GPM/PSID per 10 inch cartridge equivalent, 10.5GPM/PSID per 10 inch cartridge equivalent, 16.0GPM/PSID per 10 inch cartridge equivalent, 0.85GPM/PSID per 10 inch cartridge equivalent, 2.0GPM/PSID per 10 inch
Safety Warning

Description complète du produit

The Fluoroflow-Select pleated membrane filter cartridge provides exceptional flow rates and on-stream life. It utilizes our unique SELECT pleat technology which increases filtration area and flow rate by over 70% versus our standard Fluoroflow filter. This results in increased bath turnover and longer filter life demanded by today's fabs. The all-fluoropolymer construction provides excellent chemical resistance for the most aggressive applications up to 180°C.

Available wet-packed for quick installation or Ultraclean wet-packed which offers the lowest metals extractables in the industry.
Features/Benefits  
• Large filtration area for longer life
• High flow rates for increased bath turn over
• Wet-pack option for quick installation
• Ultraclean wet-pack option for absolute cleanliness
• All-fluoropolymer for maximum chemical resistance
• 100% integrity tested for consistent quality
Applications
• Wet etch and clean filtration for the following
– Phosphoric acid
– Sulfuric acid
– Hydrofluoric acid
– Nitric acid
– Piranha
– SC1, SC2
– NMP-based solvents Other high temperature or ozonated processes
• Filtration for other high temperature or ozonated processes

Documents annexes

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687PDC
679945